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Our Institute

           ITME is a leading Polish Institute of leading multi-research to develop new materials and materials based on these innovative tools and components for applications in electronics, microsystems, optoelectronics, micromechanics, metrology, etc.
            Developed at the Institute high-tech materials, instruments and components enable scientific collaboration with universities and research institutes, are published in Polish and international journals, offered to interested customers to implement their projects, implemented in the industry or used for short series production within the Institute.
             The ITME manufacturing technologies are being developed single crystals of semiconductor materials, oxide crystals (optical, piezoelectric), super-pure metals, glass active. Nanotechnologies are widely used in studies of new materials such as photonic crystals, metamaterials make it possible to produce super-pure materials, glass active fiber, photonic, a new (active and transparent) nanoceramikę and composite materials, which have unique properties in a wide range of applications.
            The Institute developed epitaxial structures for electronic and optoelectronic devices, innovative lasers, photodetectors, sensors, filters, piezoelectric, diffractive lenses.

The idea of single-crystal growth method invented by Prof. Jan Czochralski, widely used in the world, is continued at the Institute. Development of this method, leads to the subsequent development of highly advanced technologies in a field of semiconductor and oxide single crystals.

R & D works of ITME cover the following areas:

Materials:

    * Single crystals of silicon (Si plates undercoats, class of sensors, high-quality, precision-oriented, with a diameter of 6 inches)
    * Epitaxial layers on silicon (high resistivity and thickness) porous silicon, epitaxial silicon layer porous plate welded Si, SOI's,
    * Semiconductor compounds III / V (GaAs, InP, InAs, GaP) shallow epitaxial structure,
    * Oxide crystals - materials for lasers, passive Q modulators, scintillators, electro-optical and piezoelectric devices, the substrate for superconducting layer HTSc, nonlinear and optoelectronic materials,
    * Epitaxial structure on GaN,
    * Epitaxial plates and layers of SiC,
    * Self-organizing materials, metamaterials, photonic crystals
    * New pottery of different shapes and sizes, ceramic composite, metal-ceramic composites, ceramic-metal joints
    * Glass selling specially designed spectral characteristics, optical fibers, optical fibers and photonic active,
    * Pastes for hybrid microcircuits.

Processing:

    * Design and manufacture of masks
    * Deposition of thin films: dielectrics (SiO2, Si3N4, AlN) multilayer metallization
    * Lithograph: copy the contact in the deep UV, electron beam pattern generation
    * Etching (RIE and ICP RIE), controlled digestion of the side walls in deep, deep etching profiles of tens of microns

Measurements:

    * Characterization of materials
    * I-V measurements, the C-V analysis
    * Measurements of impedance matrix elements distributed to the 20 GHz frequency
    * Measurements of low levels of noise at frequencies up to 100 kHz
    * Measurements of lasers and photodetectors
    * Characterization of optoelectronic devices, and microelectronic

Components and devices:

    * Rods, optical fibers, filters, lenses, two-dimensional photonic microstructures,

          *  SAW filters, resonators, sensors, actuators

    * Passive components on the membranes (sensors)
    * Filters, resonators, sensors and actuators with AFP
    * The active devices (lasers, transistors, photodetectors, diodes Shottky)


Many of these jobs have a high innovative nature of the confirmed agreements with several major industry in the world.

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