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Our Institute
ITME is a leading Polish
Institute of leading multi-research to develop new materials and materials
based on these innovative tools and components for applications in electronics,
microsystems, optoelectronics, micromechanics, metrology, etc.
Developed
at the Institute high-tech materials, instruments and components enable
scientific collaboration with universities and research institutes, are
published in Polish and international journals, offered to interested customers
to implement their projects, implemented in the industry or used for short
series production within the Institute.
The
ITME manufacturing technologies are being developed single crystals of
semiconductor materials, oxide crystals (optical, piezoelectric), super-pure
metals, glass active. Nanotechnologies are widely used in studies of new materials
such as photonic crystals, metamaterials make it possible to produce super-pure
materials, glass active fiber, photonic, a new (active and transparent)
nanoceramikę and composite materials, which have unique properties in a wide
range of applications.
The
Institute developed epitaxial structures for electronic and optoelectronic
devices, innovative lasers, photodetectors, sensors, filters, piezoelectric,
diffractive lenses.
The idea of single-crystal growth method invented by Prof. Jan Czochralski,
widely used in the world, is continued at the Institute. Development of
this method, leads to the subsequent development of highly advanced
technologies in a field of semiconductor and oxide single crystals.
R & D works of ITME cover the following areas:
Materials:
* Single crystals of silicon (Si plates undercoats,
class of sensors, high-quality, precision-oriented, with a diameter of 6
inches)
* Epitaxial layers on silicon (high resistivity and
thickness) porous silicon, epitaxial silicon layer porous plate welded Si,
SOI's,
* Semiconductor compounds III / V (GaAs, InP, InAs,
GaP) shallow epitaxial structure,
* Oxide crystals - materials for lasers, passive Q
modulators, scintillators, electro-optical and piezoelectric devices, the
substrate for superconducting layer HTSc, nonlinear and optoelectronic
materials,
* Epitaxial structure on GaN,
* Epitaxial plates and layers of SiC,
* Self-organizing materials, metamaterials, photonic
crystals
* New pottery of different shapes and sizes, ceramic
composite, metal-ceramic composites, ceramic-metal joints
* Glass selling specially designed spectral
characteristics, optical fibers, optical fibers and photonic active,
* Pastes for hybrid microcircuits.
Processing:
* Design and manufacture of masks
* Deposition of thin films: dielectrics (SiO2, Si3N4,
AlN) multilayer metallization
* Lithograph: copy the contact in the deep UV, electron
beam pattern generation
* Etching (RIE and ICP RIE), controlled digestion of
the side walls in deep, deep etching profiles of tens of microns
Measurements:
* Characterization of materials
* I-V measurements, the C-V analysis
* Measurements of impedance matrix elements distributed
to the 20 GHz frequency
* Measurements of low levels of noise at frequencies up
to 100 kHz
* Measurements of lasers and photodetectors
* Characterization of optoelectronic devices, and
microelectronic
Components and devices:
* Rods, optical fibers, filters, lenses,
two-dimensional photonic microstructures,
* SAW filters, resonators, sensors, actuators
*
Passive components on the membranes (sensors)
* Filters, resonators, sensors and actuators with AFP
* The active devices (lasers, transistors,
photodetectors, diodes Shottky)
Many of these jobs have a high innovative nature of the confirmed agreements
with several major industry in the world.